LB Deposition Trough size options:
All Nima LB Deposition Troughs have a
subphase depth of 4mm. Dipping well dimensions, and hence suitable substrate
areas, are dependent on the model of trough (see descriptions below). The LB
dipping mechanism can support substrates of up to 3mm thickness. Horizontal (LS)
deposition can also be performed on all LB Deposition Troughs using the optional
LS Deposition Kit.
The conventional LB Deposition Trough is available in four sizes.
The Small LB Deposition Trough has
a subphase area of 15x7cm, a maximum monolayer containment area of 85cm2
and requires approximately 70ml of liquid to form a subphase. The dipping well
has a 28mm diameter and 32mm depth. The
LB dipping mechanism has a vertical stroke length of 40mm. This trough is ideal
for deposition of small numbers of layers on substrates such as interdigitated
electrode arrays used for electrical conductivity measurements, silicon for
Atomic Force Microscopy or glass for UV-visible absorbance measurements. The
size of the trough is ideal for studies of expensive, exotic materials or when
bench space is a large concern.
The Medium LB Deposition Trough has
a subphase area of 30x10cm and a maximum monolayer containment area of 265cm2,
suitable for high compression of a larger range of molecules. Approximately
185ml of liquid is required to form a subphase. The larger area improves
positional accuracy of the surface pressure-area isotherm plots from which the
area per molecule is determined. This trough comes with a 40mm stroke length LB
dipping mechanism. The dipping well has dimensions 50x22x30mm depth and is ideal
for deposition of many layers on most substrate types including quartz crystal
substrates for QCM monolayer mass measurements. Langmuir-Schaefer horizontal
dipping is also possible on this trough.
The Large LB Deposition Trough has
a subphase area of 30x20cm, a maximum monolayer containment area of 535cm2 and
requires approximately 465ml of liquid to form a subphase. This trough can
comfortably accommodate the
Nima MicroBAM monolayer visualisation
instrument across the centre-line of the compressed monolayer. A 75mm stroke LB
dipping mechanism is included with this trough. The large dipping well has
dimensions of 100x22x75mm depth and is
ideal for depositing many layers on larger substrates or even on several
substrates at the same time for optimum reproducibility of results. A large
amount of Langmuir-Schaefer horizontal dipping can also be performed from one
compressed film.
The Extra-Large LB Deposition Trough
has a subphase area of 68.5x20cm, a maximum monolayer containment area of
1300cm2 and requires
approximately 1.8l of liquid to form a subphase.This trough comes with a 75mm
stroke LB dipping mechanism. The large dipping well has dimensions of 120x120x80mm
depth and is suitable for dipping onto whole silicon wafers of up to 115mm
/ 4.5\" diameter, to a depth of 80mm. A
very large number of depositions on large substrates can be performed
from one spread film on this trough.
ima Technology
manufacture scientific instruments for the fabrication and characterisation of
thin films. Our instruments can fabricate films with a thickness as small as a
couple of nanometres, just one molecule thick.
